-Hyaluronic Acid: For intense, long-term hydration with a plumping effect, reducing the formation of wrinkles; leaves the skin looking refreshed and radiant.
-Exopolysaccharide: Strengthens the skin’s defense against pollution and targets signs of atmospheric skin aging.
-Purslane: A strong antioxidant with high levels of vitamins A, C, E, and omega-3 fatty acids, supports skin health and reduces the visible signs of irritation.
-Cocoa Seeds: Help the skin combat signs of digital aging caused by computers and mobile phones.
Water, Betaine, Lactobacillus/Portulaca Oleracea Ferment Extract, Butylene Glycol, Phenoxyethanol, Carbomer, Ethylhexylglycerin, Sodium Hyaluronate, Leuconostoc/Radish Root Ferment Filtrate, Alteromonas Ferment Extract, Biosaccharide Gum-1, Sodium Hydroxide, Theobroma Cacao (Cocoa) Seed Extract.
Clean at Sephora products are formulated without the following banned or restricted ingredients (please see Clean at Sephora landing page for full list of specific restrictions and allowances by category – this is not an exhaustive list):
Acrylates, Aluminum Salts, Animal Musks/Fats/Oils, Benzophenones and related compounds, Butoxyethanol, Butylated hydroxyanisole (BHA), Butylated hydroxytulolene (BHT) under 0.1% , Carbon Black or Black 2, Coal Tar, Ethanolamines, Formaldehyde and Formaldehyde Releasing Agents, Hydroquinone, Lead and Lead Acetate, Mercury + Mercury Compounds (Thimerisol), Methoxyethanol, Methyl Cellosolve, Methylchloroisothiazolinone and Methylisothiazolinone, Mineral Oil, Nanomaterials (restrictions for specific nanomaterials only), Oxybenzone, Parabens, Petrolatum and Parrafin (USP grade only), Phenoxyethanol under 1%, Phthalates, Plastic Microbeads, Polyacrylamide & Acrylamide, Resorcinol, Retinyl Palmitate, Styrene, Sulfates, Talc (no detection of asbestos) , Toluene, Triclosan and Triclocarban, Undisclosed Synthetic Fragrance (under 1% and formulated without Acetaldehyde, Acetone, Acetonitrile, Benzalkonium chloride, BPA, EDTA, Methylene chloride, PTFE, PFOA), 1, 4, Dioxane (ingredients must comply with impurity thresholds), Octinoxate, PFAS compounds, Nitromusks and Polycyclic Musks, Ethoxylated Ingredients (including PEGS or polyethylene glycol must meet contamination limits for 1’4 Dioxane and ethylene oxide), Cyclic Silicones, EDTA and derivatives (allowed if no technical substitute under 0.2%)