Tatcha Luminous Deep Hydration Lifting Mask
Luminous Deep Hydration Lifting Mask

Which skin type is it good for? Normal Oily Combination Dry Sensitive A unique, coconut-derived sheet mask that boosts the moisture content of skin by up to 200 percent in 15 minutes for a luminous, plump-looking complexion.

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Water, Glycerin, Propanediol, Methyl Gluceth-¬‐20, Alcohol,Camellia Sinensis (Green Tea) Leaf Extract, Inositol (Rice Extract), Algae Extract, Sericin (Silk Extract), Panax Ginseng Root Extract, Royal Jelly Extract, Chondrus Crispus (Red Algae) Extract,Thymus Serpillum (Thyme) Extract, Ppg-¬‐6-¬‐ Decyltetradeceth-¬‐ 20,Ethylhexylglycerin, Polyglyceryl-¬‐ 10eicosanedioate/Tetradecanedioate, Polyglyceryl-¬‐10 Isostearate, Xanthan Gum, Sodium Hyaluronate, Fragrance (Natural), Phenoxyethanol. Clean at Sephora products are formulated without the following banned or restricted ingredients (please see Clean at Sephora landing page for full list of specific restrictions and allowances by category – this is not an exhaustive list): Acrylates, Aluminum Salts, Animal Musks/Fats/Oils, Benzophenones and related compounds, Butoxyethanol, Butylated hydroxyanisole (BHA), Butylated hydroxytulolene (BHT) under 0.1% , Carbon Black or Black 2, Coal Tar, Ethanolamines, Formaldehyde and Formaldehyde Releasing Agents, Hydroquinone, Lead and Lead Acetate, Mercury + Mercury Compounds (Thimerisol), Methoxyethanol, Methyl Cellosolve, Methylchloroisothiazolinone and Methylisothiazolinone, Mineral Oil, Nanomaterials (restrictions for specific nanomaterials only), Oxybenzone, Parabens, Petrolatum and Parrafin (USP grade only), Phenoxyethanol under 1%, Phthalates, Plastic Microbeads, Polyacrylamide & Acrylamide, Resorcinol, Retinyl Palmitate, Styrene, Sulfates, Talc (no detection of asbestos) , Toluene, Triclosan and Triclocarban, Undisclosed Synthetic Fragrance (under 1% and formulated without Acetaldehyde, Acetone, Acetonitrile, Benzalkonium chloride, BPA, EDTA, Methylene chloride, PTFE, PFOA), 1, 4, Dioxane (ingredients must comply with impurity thresholds), Octinoxate, PFAS compounds, Nitromusks and Polycyclic Musks, Ethoxylated Ingredients (including PEGS or polyethylene glycol must meet contamination limits for 1’4 Dioxane and ethylene oxide), Cyclic Silicones, EDTA and derivatives (allowed if no technical substitute under 0.2%)